Recent progress in performance enhancement methods for capacitive silicon resonator will be outlined in this work. Several technological approaches including hermetic packaging based on the LTCC substrate, deep reactive ion etching, neutral beam etching technology, and metal-assisted chemical etching, will be discussed.
Read More
Recent progress in performance enhancement methods for capacitive silicon resonator will be outlined in this work. Several technological approaches including hermetic packaging based on the LTCC substrate, deep reactive ion etching, neutral beam etching technology, and metal-assisted chemical etching, will be discussed.
Read Less
