Pattern Recognition and Machine Learning: Proceedings of the Japan-U.S. Seminar on the Learning Process in Control Systems, Held in Nagoya, Japan August 18-20, 1970
Pattern Recognition and Machine Learning: Proceedings of the Japan-U.S. Seminar on the Learning Process in Control Systems, Held in Nagoya, Japan August 18-20, 1970
This book contains the Proceedings of the US-Japan Seminar on Learning Process in Control Systems. The seminar, held in Nagoya, Japan, from August 18 to 20, 1970, was sponsored by the US-Japan Cooperative Science Program, jointly supported by the National Science Foundation and the Japan Society for the Promotion of Science. The full texts of all the presented papers except two t are included. The papers cover a great variety of topics related to learning processes and systems, ranging from pattern recognition to systems ...
Read More
This book contains the Proceedings of the US-Japan Seminar on Learning Process in Control Systems. The seminar, held in Nagoya, Japan, from August 18 to 20, 1970, was sponsored by the US-Japan Cooperative Science Program, jointly supported by the National Science Foundation and the Japan Society for the Promotion of Science. The full texts of all the presented papers except two t are included. The papers cover a great variety of topics related to learning processes and systems, ranging from pattern recognition to systems identification, from learning control to biological modelling. In order to reflect the actual content of the book, the present title was selected. All the twenty-eight papers are roughly divided into two parts--Pattern Recognition and System Identification and Learning Process and Learning Control. It is sometimes quite obvious that some papers can be classified into either part. The choice in these cases was strictly the editor's in order to keep a certain balance between the two parts. During the past decade there has been a considerable growth of interest in problems of pattern recognition and machine learn ing. In designing an optimal pattern recognition or control system, if all the a priori information about the process under study is known and can be described deterministically, the optimal system is usually designed by deterministic optimization techniques.
Read Less
Add this copy of Pattern Recognition and Machine Learning: Proceedings to cart. $10.41, Sold by Zubal Books rated 5.0 out of 5 stars, ships from Cleveland, OH, UNITED STATES, published 1971 by Plenum.
Choose your shipping method in Checkout. Costs may vary based on destination.
Seller's Description:
344 pp., hardcover, ex library else text clean & binding tight (lacks dust jacket). -If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country.
Add this copy of Pattern Recognition and Machine Learning: Proceedings to cart. $16.27, very good condition, Sold by GuthrieBooks rated 5.0 out of 5 stars, ships from Spring Branch, TX, UNITED STATES, published 1971 by Plenum Press.
Choose your shipping method in Checkout. Costs may vary based on destination.
Seller's Description:
Very Good. Size: 10x6x1; Ex-Library hardcover no dj (blue boards) in very nice condition with the usual markings and attachments. Sunned spine. Except for library markings, interior clean and unmarked. Tight binding.
Add this copy of Pattern Recognition and Machine Learning: Proceedings to cart. $25.30, good condition, Sold by Books From California rated 4.0 out of 5 stars, ships from Simi Valley, CA, UNITED STATES, published 1971 by Plenum Press.
Add this copy of Pattern Recognition and Machine Learning: Proceedings to cart. $46.60, good condition, Sold by Bonita rated 4.0 out of 5 stars, ships from Santa Clarita, CA, UNITED STATES, published 1971 by Plenum Press.
Add this copy of Pattern Recognition and Machine Learning to cart. $55.18, Sold by BookDepart rated 4.0 out of 5 stars, ships from Shepherdstown, WV, UNITED STATES, published 1971 by Plenum Press.
Choose your shipping method in Checkout. Costs may vary based on destination.
Seller's Description:
UsedGood. Hardcover; proceedings of the Japan-U.S. Seminar on the Learning Process in Control Systems, held in Nagoya, Japan August 18-20, 1970; fading and shel f wear to exterior; former owner's stamping on endpapers; otherwise in good condition with clean text, firm binding.
Add this copy of Pattern Recognition and Machine Learning: Proceedings to cart. $131.11, new condition, Sold by Ingram Customer Returns Center rated 5.0 out of 5 stars, ships from NV, USA, published 2012 by Springer-Verlag New York Inc..
Add this copy of Pattern Recognition and Machine Learning: Proceedings to cart. $149.66, new condition, Sold by Ria Christie Books rated 4.0 out of 5 stars, ships from Uxbridge, MIDDLESEX, UNITED KINGDOM, published 2012 by Springer-Verlag New York Inc..
All Editions of Pattern Recognition and Machine Learning: Proceedings of the Japan-U.S. Seminar on the Learning Process in Control Systems, Held in Nagoya, Japan August 18-20, 1970