Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.
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Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.
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Add this copy of Polymers for Microelectronics: Resists and Dielectrics. to cart. $19.00, very good condition, Sold by J. Hood, Booksellers, Inc. rated 5.0 out of 5 stars, ships from Baldwin City, KS, UNITED STATES, published 1994 by American Chemical Society.
Add this copy of Polymers for Microelectronics: Resists and Dielectrics to cart. $50.26, good condition, Sold by Bonita rated 4.0 out of 5 stars, ships from Santa Clarita, CA, UNITED STATES, published 1994 by American Chemical Society.
